TATCHA The Rice Polish Deep powder-to-foam exfoliator — 60 g for oily, acne-prone skin with papaya enzymes & silk protein

Tatcha The Rice Polish Deep is a water-activated, non-abrasive exfoliant that transforms from powder to a creamy foam to polish oily and acne-prone skin.

Inspired by traditional Japanese rice bran treatments, this powder-to-foam exfoliant combines finely ground rice bran, papaya enzymes and silk protein to lift dead skin cells and clarify pores without harsh scrubbing. Formulated on a pH-neutral, amino-acid cleansing base, it supports natural skin turnover while preserving moisture and the skin’s barrier. The Deep formula is tailored for combination to oily and breakout-prone skin, with Japanese Wild Rose to help tighten the appearance of pores and Hadasei-3 (green tea, rice, algae) to promote a balanced, healthy-looking complexion.

How does The Rice Polish Deep work on congested or oily skin?

The Rice Polish Deep uses a dual-action approach: gentle physical polishing from ultra-fine rice bran plus enzymatic exfoliation from papaya extract. The powder activates into a soft cream when mixed with water, so you get effective exfoliation without gritty friction.

• Fine rice bran gently buffs away dead surface cells.
• Papaya enzymes support natural exfoliation and unclog pores.
• pH-neutral amino-acid base cleanses without over-drying.

Will it irritate sensitive or acne-prone skin?

Although designed for oily and acne-prone complexions, the formula aims to be non-irritating by avoiding harsh abrasives and stripping surfactants. If you have reactive skin, patch-testing is recommended and use can be adjusted to less frequent application to gauge tolerance.

• Non-abrasive, powder-to-foam texture minimizes mechanical irritation.
• Hydrating silk protein and amino-acid base help maintain moisture.
• Start with once or twice weekly use for sensitive or inflamed areas.

How should I incorporate it into my skincare routine?

Use The Rice Polish Deep after removing makeup and before serums and moisturizers. Wet your hands, scoop a small amount, work with water into a creamy foam, massage gently over damp skin, then rinse thoroughly and follow with toner, treatment serums and moisturizer.

• Use 1–3 times weekly for maintenance; more frequent use may be suitable for oily skin types.
• Avoid combining with other strong chemical exfoliants on the same day.
• Always follow with SPF during daytime to protect renewed skin.

What visible benefits can I expect and when?

Many users notice a smoother texture and more even-looking skin after the first few uses thanks to lifted surface buildup. With consistent, moderate use, pigmentation, pore appearance and the look of fine lines can appear improved as skin turnover becomes more regular.

• Immediate: softer, cleaner-feeling skin and a smoother surface.
• 2–6 weeks: improved clarity, reduced congestion, more even tone.
• Long term: maintained glow and a polished, makeup-ready canvas.

Who this product is for: The Rice Polish Deep suits people with combination to oily, congested or acne-prone skin looking for a gentle yet effective exfoliation method that avoids gritty scrubs. It’s ideal for those who prefer a traditional Japanese-inspired approach—powder activated into a creamy foam—to polish the skin while preserving hydration and barrier function. If you have very dry or highly reactive skin, consider The Rice Polish Classic or consult patch-testing before regular use.

Ingredients

Microcrystalline Cellulose, Oryza Sativa (Rice) Powder, Sodium Lauryl Phosphate, Sodium Palmoyl Glutamate, Sodium Lauroyl Glutamate, Lauryl Betaine, Sodium Lauroyl Methylaminopropionate, Saccharomyces/Camellia Sinensis Leaf/Cladosiphon Okamuranus/Rice Ferment Filtrate*, Papain, Rosa Multiflora Fruit Extract, Belamcanda Chinensis Root Extract, Houttuynia Cordata Extract, Oryza Sativa (Rice) Bran, Aqua/Water/Eau, Propanediol, Dextrin, Butylene Glycol, Ethylhexylglycerin, Phytosteryl/Octyldodecyl Lauroyl Glutamate, Tocopherol, Alcohol, Phenoxyethanol, Iron Oxides (Ci 77492), Ultramarines (Ci 77007)